First order process modeling can help tremendously with process setup and integration challenges that occur in a semiconductor fabrication flow, by visualizing process variation problems “virtually” ...

(a) Unit optimization process with a hybrid continuous-discrete PSO algorithm. The particulars of the yellow and green boxes in the optimization are elaborated in (b) and (c), respectively. (b) The ...

Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

Just when you think you’ve learned all the latest 3D printing tricks, [TenTech] shows up with an update to their Fuzzyficator post-processing script. This time, the GPL v3 licensed program has gained ...